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| 020 |
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|a 0824799518
|z (alk. paper)
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| 050 |
1 |
4 |
|a TK7871.85
|b .N66 1998
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| 082 |
0 |
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|2 21
|a 621.3815/2
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| 100 |
1 |
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|a Nonogaki, Saburo
|d 1930-
|
| 245 |
1 |
0 |
|a Microlithography fundamentals in semiconductor devices and fabrication technology /
|c Saburo Nonogaki, Takumi Ueno, Toshio Ito
|
| 260 |
|
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|a New York :
|b Marcel Dekker ,
|c c1998 .
|
| 300 |
|
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|a v, 327 p. :
|b ill. ;
|c 24 cm.
|
| 504 |
|
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|a Includes bibliographical references and index.
|
| 650 |
1 |
0 |
|a Manufacturing processes
|
| 650 |
1 |
0 |
|a Microlithography
|x Industrial applications
|
| 650 |
1 |
0 |
|a Photoresists
|
| 650 |
1 |
0 |
|a Semiconductors
|x Design and construction
|
| 700 |
1 |
|
|a Ito, Toshio
|
| 700 |
1 |
|
|a Ueno, Takumi
|
| 952 |
|
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|a GR-AtTEI
|b 59cc7da56c5ad13446fd0194
|c 998a
|d 945l
|e -
|t 1
|x m
|z Books
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