High-k gate dielectrics for CMOS technology
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| Format: | Book |
| Language: | English |
| Published: |
Weinheim :
Wiley-VCH,
2012.
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| Online Access: | http://site.ebrary.com/lib/ucy/Doc?id=10653595 |
Table of Contents:
- pt. 1. Scaling and challenging of Si-based CMOS
- pt. 2. High-k deposition and materials characterization
- pt. 3. Challenge in interface engineering and electrode
- pt. 4. Development in non-Si-based CMOS technology
- pt. 5. High-k Application in novel devices
- pt. 6. Challenge and directions.