Atomic layer deposition principles, characteristics, and nanotechnology applications /

Main Author: Kaariainen, Tommi.
Corporate Author: ebrary, Inc.
Format: Book
Language:English
Published: Hoboken, NJ : John Wiley & Sons, c2013.
Edition:2nd ed.
Subjects:
Online Access:http://site.ebrary.com/lib/ucy/Doc?id=10715316
LEADER 00885nam a2200241 a 4500
001 1763670
005 20171111234512.0
008 130422s2013 njua sb 001 0 eng d
020 |z 9781118062777 (cloth : alk. paper) 
040 |a CaPaEBR  |z 9781118747421 (ebook) 
050 1 4 |a TS695  |b .K33 2013eb 
100 1 |a Kaariainen, Tommi. 
245 1 0 |a Atomic layer deposition  |b principles, characteristics, and nanotechnology applications /  |c Tommi Kaariainen ... [et al.]. 
250 |a 2nd ed. 
260 |a Hoboken, NJ :  |b John Wiley & Sons,  |c c2013. 
300 |a xv, 253 p. :  |b ill. 
504 |a Includes bibliographical references and index. 
650 0 |a Chemical vapor deposition. 
650 0 |a Epitaxy. 
650 0 |a Microelectronics. 
710 2 |a ebrary, Inc. 
856 4 0 |u http://site.ebrary.com/lib/ucy/Doc?id=10715316 
952 |a CY-NiOUC  |b 5a0454516c5ad14ac1ec98aa  |c 998a  |d 945l  |e -  |t 1  |x m  |z Books