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00885nam a2200241 a 4500 |
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1763670 |
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20171111234512.0 |
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130422s2013 njua sb 001 0 eng d |
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|z 9781118062777 (cloth : alk. paper)
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|a CaPaEBR
|z 9781118747421 (ebook)
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050 |
1 |
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|a TS695
|b .K33 2013eb
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100 |
1 |
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|a Kaariainen, Tommi.
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245 |
1 |
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|a Atomic layer deposition
|b principles, characteristics, and nanotechnology applications /
|c Tommi Kaariainen ... [et al.].
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250 |
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|a 2nd ed.
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260 |
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|a Hoboken, NJ :
|b John Wiley & Sons,
|c c2013.
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300 |
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|a xv, 253 p. :
|b ill.
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504 |
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|a Includes bibliographical references and index.
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650 |
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0 |
|a Chemical vapor deposition.
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650 |
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0 |
|a Epitaxy.
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650 |
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0 |
|a Microelectronics.
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710 |
2 |
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|a ebrary, Inc.
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856 |
4 |
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|u http://site.ebrary.com/lib/ucy/Doc?id=10715316
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|a CY-NiOUC
|b 5a0454516c5ad14ac1ec98aa
|c 998a
|d 945l
|e -
|t 1
|x m
|z Books
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