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00851nam a2200229 a 4500 |
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20171111233558.0 |
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040909s1994 cy da r 000 u eng d |
| 020 |
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|a 0471005770
|q hbk.
|
| 040 |
|
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|a CY
|b University of Cyprus
|e AACR2
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| 050 |
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|a QC718.5.D9L54 1994
|
| 100 |
1 |
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|a Lieberman, Michael A.
|
| 245 |
1 |
0 |
|a Principles of plasma discharges and materials processing/
|c Michael A. Lieberman, Allan J. Lichtenberg
|
| 260 |
|
|
|a New York:
|b Wiley,
|c c1994
|
| 300 |
|
|
|a xxvi, 572 p. :
|b ill. ;
|c 25 cm.
|
| 500 |
|
|
|a "A Wiley-Interscience publication."
|
| 504 |
|
|
|a Includes bibliographical references (p. 559-564) and index.
|
| 650 |
|
0 |
|a Plasma dynamics
|
| 650 |
|
0 |
|a Thin films
|x Surfaces
|
| 650 |
|
0 |
|a Plasma etching
|
| 700 |
1 |
|
|a Lichtenberg, Allan J.
|
| 952 |
|
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|a CY-NiOUC
|b 5a0429b56c5ad14ac1e80122
|c 998a
|d 945l
|e QC718.5.D9L54 1994
|t 1
|x m
|z Books
|
