The photoelastic effect and its applications : symposium, Belgium, September 10-16, 1973: [proceedings] /
Corporate Authors: | Symposium on the Photoelastic Effect and Its Applications Ottignies, Belgium), Springer, International Union of Theoretical and Applied Mechanics, Permanent Committee for Stress Analysis, Society for Experimental Stress Analysis |
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Other Authors: | Kestens, Jean |
Format: | Book |
Language: | English |
Published: |
Berlin ; New York:
Springer-Verlag,
1975
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Subjects: |
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